Plasma reactor with conductive member in reaction chamber for shielding substrate from undesirable irradiation
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United States of America Patent
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Nov 3, 2015
Grant Date -
Sep 12, 2013
app pub date -
Feb 21, 2013
filing date -
Mar 12, 2012
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Abstract
Placing a conductive member between a plasma chamber in a remote plasma reactor and a substrate to shield the substrate from irradiation of undesirable electromagnetic radiation, ions or electrons. The conductive member blocks the electromagnetic radiation, neutralizes ions and absorbs the electrons. Radicals generated in the plasma chambers flows to the substrate despite the placement of the conductive member. In this way, the substrate is exposed to the radicals whereas damages to the substrate due to electromagnetic radiations, ions or electrons are reduced or removed.
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