Dispersions of submicron doped silicon particles
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United States of America Patent
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Nov 3, 2015
Grant Date -
Feb 20, 2014
app pub date -
Oct 28, 2013
filing date -
Oct 17, 2000
priority date (Note) -
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Abstract
Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.
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International Classification(s)
- C01B:NON-METALLIC ELEMENTS; COMPOUNDS THEREOF
- B82Y:SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; ....
- C04B:LIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREO....
- C09D:COATING COMPOSITIONS, e.g. PAINTS, VARNISHES, LACQ....
- B22F:WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES F....
- C01G:COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLAS....
- C01F:COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUM....
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