Molybdenum allyl complexes and use thereof in thin film deposition

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United States of America Patent

PATENT NO 9175023
APP PUB NO 20140370192A1
SERIAL NO

14374289

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Abstract

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Molybdenum complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The molybdenum complexes correspond in structure to Formula (I) and Formula (II), wherein R1, R3, R5, R7, R8 and R10 are independently and at each occurrence alkyl; R2, R6 and R9 are independently alkyl; R4 and R11 are independently and at each occurrence selected from the group consisting of alkyl, alkenyl, and alkynyl; x, z, a, c, d and f are independently zero, 1, or 2; y, b and e are independently zero or 1; and n and m are independently zero to 5.

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Patent Owner(s)

Patent OwnerAddress
SIGMA-ALDRICH CO LLC3050 SPRUCE STREET ST LOUIS MO 63103

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Garratt, Shaun Wirral, GB 6 393
Kanjolia, Ravi North Andover, US 16 1249
Odedra, Rajesh Altringham, GB 25 1788
Saly, Mark North Andover, US 123 1499

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