Plasma pulse tracking system and method
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United States of America Patent
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Oct 27, 2015
Grant Date -
Jun 5, 2014
app pub date -
Jun 10, 2013
filing date -
Jun 15, 2012
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Abstract
A plasma processing system may include a radio frequency (RF) generator configured to supply a pulsing process signal to a target in a plasma processing chamber via a RF matching network. A phase and magnitude detector circuit is coupled to the RF generator and configured to sense the pulsing process signal and output a magnitude error signal and a phase error signal. A pulse tracking circuit is electrically coupled to the phase and magnitude detector circuit and configured to receive the magnitude error signal and the phase error signal and output a tracked magnitude signal and a tracked phase signal. A match controller is electrically coupled to the pulse tracking circuit and the RF matching network and configured to receive the tracked magnitude signal and the tracked phase signal and vary an impedance of the RF matching network in response to the tracked magnitude and phase signals.
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