Charged particle beam lithography apparatus, inspection apparatus and inspection method of pattern writing data
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United States of America Patent
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Oct 20, 2015
Grant Date -
Oct 10, 2013
app pub date -
Mar 25, 2013
filing date -
Mar 29, 2012
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Abstract
An inspection method of pattern writing data includes creating an area map of a figure pattern written on a target object for each modulation rate for modulating a dose by using modulation rate data to modulate the dose in a case that a plurality of figure patterns is written on the target object by using a charged particle beam, and layout data in which the plurality of figure patterns is defined; converting the layout data into pattern writing data to be input into a lithography apparatus; and inspecting an amount of electric charge for each predetermined region by using the area map when a pattern is written on the target object by using the pattern writing data.
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