Enhanced deposition of layer on substrate using radicals
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United States of America Patent
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Oct 20, 2015
Grant Date -
Aug 23, 2012
app pub date -
Feb 15, 2012
filing date -
Feb 18, 2011
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Abstract
Embodiments relate to using radicals to at different stages of deposition processes. The radicals may be generated by applying voltage across electrodes in a reactor remote from a substrate. The radicals are injected onto the substrate at different stages of molecular layer deposition (MLD), atomic layer deposition (ALD), and chemical vapor deposition (CVD) to improve characteristics of the deposited layer, enable depositing of material otherwise not feasible and/or increase the rate of deposition. Gas used for generating the radicals may include inert gas and other gases. The radicals may disassociate precursors, activate the surface of a deposited layer or cause cross-linking between deposited molecules.
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