Reactor and method for production of silicon

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United States of America Patent

PATENT NO 9156704
APP PUB NO 20120100060A1
SERIAL NO

13266850

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Abstract

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Reactor for producing silicon by chemical vapor deposition, the reactor comprising a reactor body that forms a container, at least one inlet for a silicon-bearing gas, at least one outlet, and at least one heating device as a part of or operatively arranged to the reactor, distinctive in that at least one main part of the reactor, which part is exposed for silicon-bearing gas and which part is heated for deposition of silicon on said part, is produced from silicon. Method for operation of the reactor.

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Patent Owner(s)

Patent OwnerAddress
DYNATEC ENGINEERING ASRAKKESTADVEIEN 1 ASKIM NO-1814

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Filtvedt, Josef Tomter, NO 4 1
Filtvedt, Werner O Tomter, NO 5 3

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