Solar cell and manufacturing method thereof

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United States of America Patent

PATENT NO 9153725
APP PUB NO 20150179858A1
SERIAL NO

14465328

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Abstract

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A solar cell includes a crystalline silicon semiconductor substrate, an intrinsic amorphous silicon semiconductor layer, an amorphous silicon semiconductor layer and a transparent conductive layer. The crystalline silicon semiconductor substrate possesses a first doped type and a trench is formed thereon to form an enclosed area to define a first electrode region in the enclosed area and a second electrode region out of the enclosed area. The intrinsic amorphous silicon semiconductor layer, the amorphous silicon semiconductor layer and the transparent conductive layer are formed sequentially on the crystalline silicon semiconductor substrate and in the trench. Having discontinuity in the trench, the amorphous silicon semiconductor layer, the amorphous silicon semiconductor layer and the transparent conductive layer provide an isolation function between the previously defined first and second electrode regions.

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Patent Owner(s)

Patent OwnerAddress
NEO SOLAR POWER CORPNO 7 LI-HSIN RD 3 HSINCHU SCIENCE PARK HSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ding, Jau-Min Hsinchu, TW 29 101
Liao, Chih-Hung Hsinchu, TW 6 8
Lin, Kun-Chih Hsinchu, TW 40 273
Luan, Hsin-Chiao Hsinchu, TW 14 418
Tseng, Yi-Wen Hsinchu, TW 2 27

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