Antireflective coating composition and process thereof
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United States of America Patent
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Oct 6, 2015
Grant Date -
Dec 18, 2014
app pub date -
Jun 13, 2013
filing date -
Jun 13, 2013
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Abstract
The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3),
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