Monolithic aluminum alloy target and method of manufacturing
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United States of America Patent
Stats
-
Oct 6, 2015
Grant Date -
Nov 21, 2013
app pub date -
Jul 26, 2013
filing date -
Jan 22, 2009
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Aluminum or aluminum alloy sputter targets and methods of making same are provided. The pure aluminum or aluminum alloy is mechanically worked to produce a circular blank, and then the blank is given a recrystallization anneal to achieve desirable grain size and crystallographic texture. A 10-50% additional strain is provided to the blank step after the annealing to increase the mechanical strength. Further, in a flange area of the target, the strain is greater than in the other target areas with the strain in the flange area being imparted at a rate of about 20-60% strain. The blank is then finished to form a sputtering target with desirable crystallographic texture and adequate mechanical strength.
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Patent Citation Ranking
- 1 Citation Count
- C23C Class
- 13.95 % this patent is cited more than
- 10 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Apr 6, 2027 |
