Plasma generating device, plasma generating method, and method for suppressing ozone generation

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United States of America Patent

PATENT NO 9149551
APP PUB NO 20140003994A1
SERIAL NO

13884469

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Abstract

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The purpose of the present invention is to minimize ozone production while increasing the production of an active species. The plasma generating device (100) comprises: a pair of electrodes (21, 22) in which dielectric films (21a, 21b) are disposed on at least one opposing face; voltage application means (4) for applying a pulse voltage across the electrodes (21, 22) to bring about a plasma discharger; and fluid circulation holes (21b, 22b) that are disposed in locations corresponding to the electrodes (21, 22), respectively, and that are configured to pass entirely therethrough. The plasma generating device is also configured such that a fluid passing through the fluid circulation holes (21b, 22b) comes into contact with the plasma, generating ions or radicals, wherein the voltage applying means (4) varies the peak value and/or the pulse width of the pulse voltage applied across the electrodes (21, 22).

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTDSUWON-SI 16677

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Myung Chul Suwon-Si, KR 29 88
Kumagai, Yuki Kanagawa, JP 9 83
Miyamoto, Makoto Kanagawa, JP 141 991
Nakayama, Yoko Kanagawa, JP 42 738
Nojima, Hideo Kanagawa, JP 38 455
Takenoshita, Kazutoshi Kanagawa, JP 15 57
Yuge, Seiro Kanagawa, JP 13 24

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