X-ray source with an immersion lens

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United States of America Patent

PATENT NO 9142382
APP PUB NO 20120269323A1
SERIAL NO

13373556

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Abstract

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An x-ray source is described. During operation of the x-ray source, an electron source emits a beam of electrons. This beam of electrons is focused to a spot on a target by a magnetic focusing lens. In particular, the magnetic focusing lens includes an immersion lens in which a peak in a magnitude of an associated magnetic field occurs proximate to a plane of the target. Moreover, in response to receiving the beam of focused electrons, the target provides a transmission source of x-rays.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS X-RAY MICROSCOPY INC5300 CENTRAL PARKWAY DUBLIN CA 94568

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Adler, David L San Jose, US 65 2068
Case, Thomas Anthony Walnut Creek, US 8 151
Yun, Wenbing Walnut Creek, US 99 3901

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