Silicon-containing film-forming composition, silicon-containing film, and pattern forming method

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United States of America Patent

PATENT NO 9140985
APP PUB NO 20100233632A1
SERIAL NO

12722529

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A silicon-containing film-forming composition includes a polysiloxane and organic solvent. The polysiloxane includes a first structural unit, a second structural unit, and a third structural unit. The first structural unit is derived from a tetraalkoxysilane. The second structural unit is derived from a compound shown by a formula (1), wherein R1 represents a hydrogen atom or an electron-donating group, at least one R1 is an electron-donating group, R2 represents a monovalent organic group, and n represents 0 or 1. The third structural unit is derived from a compound shown by a formula (2), wherein R3 represents an alkyl group having 1 to 8 carbon atoms, and R4 represents a monovalent organic group.

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Patent Owner(s)

  • JSR CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kawazu, Tomoharu Tokyo, JP 4 12
Mori, Takashi Tokyo, JP 309 3137
Takanashi, Kazunori Tokyo, JP 23 51
Tanaka, Masato Tokyo, JP 502 4885
Yasuda, Kyoyu Tokyo, JP 11 82

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