Cylinder plating method and device

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United States of America Patent

PATENT NO 9133561
APP PUB NO 20130161196A1
SERIAL NO

13820641

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Provided are a plating method and a plating apparatus for a cylinder, which are capable of forming a plating layer having a uniform thickness in a technology of plating a cylinder, effectively preventing current concentration in cylinder end portions when being combined with a plating technology using divided insoluble electrodes, and performing plating with a more uniform thickness over the full length of a cylinder without generating defects such as rashes and pits irrespective of the size of the cylinder. The insoluble electrode has a shape in which a lower part thereof is curved inward, and is capable of rotating about an upper end thereof. Further, a thickness of a plating layer on an outer peripheral surface of the cylinder is adjusted by controlling an interval of closeness to the cylinder.

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Patent Owner(s)

Patent OwnerAddress
THINK LABORATORY CO LTDKASHIWA-SHI CHIBA 277-8525

International Classification(s)

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  • 2011 Application Filing Year
  • C25D Class
  • 430 Applications Filed
  • 287 Patents Issued To-Date
  • 66.75 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20112012201320142015201620172018201920200255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shigeta, Tatsuo Kashiwa, JP 54 317

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges8122937161015311301 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 90100 +0102030405060708090100110120130140150160170180190200210220230240250

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