Emitter structure, gas ion source and focused ion beam system

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United States of America Patent

PATENT NO 9129771
APP PUB NO 20140291542A1
SERIAL NO

14224149

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Abstract

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There is provided an emitter structure, a gas ion source including the emitter structure, and a focused ion beam system including the gas ion source. The emitter structure includes a pair of conductive pins which are fixed to a base member, a filament which is connected between the pair of conductive pins, and an emitter which is connected to the filament and has a sharp tip. A supporting member is fixed to the base material, and the emitter is connected to the supporting member.

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Patent Owner(s)

Patent OwnerAddress
HITACHI HIGH-TECH SCIENCE CORPORATION24-14 NISHI-SHIMBASHI 1-CHOME MINATO-KU TOKYO 105-0003

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Oba, Hiroshi Tokyo, JP 30 94
Sugiyama, Yasuhiko Tokyo, JP 50 243
Yasaka, Anto Tokyo, JP 20 83

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