Target supply device and EUV light generation chamber
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United States of America Patent
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Sep 1, 2015
Grant Date -
Jul 31, 2014
app pub date -
Jan 21, 2014
filing date -
Jan 25, 2013
priority date (Note) -
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Abstract
A target supply device may include a tank including a nozzle, a first electrode disposed within the tank, a first potential setting unit configured to set a potential at the first electrode to a first potential, a second electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole, a second potential setting unit configured to set a potential at the second electrode to a second potential that is different from the first potential, and a charge neutralization unit configured to neutralize a charge of the target material that passes through a first region located between the second electrode and the plasma generation region.
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