Susceptor support shaft for improved wafer temperature uniformity and process repeatability
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United States of America Patent
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Sep 1, 2015
Grant Date -
Sep 11, 2014
app pub date -
Feb 18, 2014
filing date -
Mar 11, 2013
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Abstract
Embodiments of the invention generally relate to susceptor support shafts and process chambers containing the same. A susceptor support shaft supports a susceptor thereon, which in turn, supports a substrate during processing. The susceptor support shaft reduces variations in temperature measurement of the susceptor and/or substrate by providing a consistent path for a pyrometer focal beam directed towards the susceptor and/or substrate, even when the susceptor support shaft is rotated. The susceptor support shafts also have a relatively low thermal mass which increases the ramp up and ramp down rates of a process chamber.
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