Dense oxide coated component of a plasma processing chamber and method of manufacture thereof
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United States of America Patent
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Sep 1, 2015
Grant Date -
Oct 2, 2014
app pub date -
Mar 27, 2013
filing date -
Mar 27, 2013
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Abstract
A method of forming a dense oxide coating on an aluminum component of semiconductor processing equipment comprises cold spraying a layer of pure aluminum on a surface of the aluminum component to a predetermined thickness. A dense oxide coating is then formed on the layer of pure aluminum using a plasma electrolytic oxidation process, wherein the plasma electrolytic oxidation process causes the layer of pure aluminum to undergo microplasmic discharges, thus forming the dense oxide coating on the layer of pure aluminum on the surface of the aluminum component.
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