Apparatus and methods for implementing predicted systematic error correction in location specific processing
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United States of America Patent
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Sep 1, 2015
Grant Date -
Aug 27, 2015
app pub date -
Sep 22, 2014
filing date -
Feb 21, 2014
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Abstract
A method of modifying an upper layer of a workpiece using a gas cluster ion beam (GCIB) is described. The method includes collecting parametric data relating to an upper layer of a workpiece, and determining a predicted systematic error response for applying a GCIB to the upper layer to alter an initial profile of a measured attribute by using the parametric data. Additionally, the method includes identifying a target profile of the measured attribute, directing the GCIB toward the upper layer of the workpiece, and spatially modulating an applied property of the GCIB, based at least in part on the predicted systematic error response and the parametric data, as a function of position on the upper layer of the workpiece to achieve the target profile of the measured attribute.
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