Apparatus for cleaning photomask
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United States of America Patent
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Sep 1, 2015
Grant Date -
Jul 25, 2013
app pub date -
Mar 5, 2013
filing date -
Aug 3, 2009
priority date (Note) -
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Abstract
Provided is a method and apparatus for cleaning a photomask. The photomask including a first region and a second region surrounding the first region, a pattern to be protected disposed on the first region, and a material to be removed exists on the second region. A cleaning liquid is sprayed from an inside region of the second region toward an outer region of the second region to remove the material, and a gas is blown from the first region toward the second region to protect the pattern.
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