Composition of matter and molecular resist made therefrom

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United States of America Patent

PATENT NO 9122156
APP PUB NO 20150140491A1
SERIAL NO

14519924

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Abstract

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Disclosed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); at least one photo acid generator; at least one crosslinker; and at least one solvent;

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Patent Owner(s)

Patent OwnerAddress
IRRESISTIBLE MATERIALS LTDBIRMINGHAM RESEARCH PARK VINCENT DRIVE EDGBASTON BIRMINGHAM B15 2SQ

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Frommhold, Andreas Anger, DE 14 38
Jackson, Edward A Franklin, US 18 98
Lada, Thomas Somerville, US 6 15
Robinson, Alex Philip Graham Birmingham, GB 7 11
Roth, John L Cohasset, US 4 13
Xue, Xiang Winchester, US 8 16
Yang, Dongxu Selly Oak Birmingham, GB 11 26

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