Patterning process and resist composition
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United States of America Patent
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Sep 1, 2015
Grant Date -
Jan 9, 2014
app pub date -
Jun 18, 2013
filing date -
Jul 9, 2012
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Abstract
A negative pattern is formed by coating a resist composition comprising a branched polymer having chains extending in at least three directions and an optional acid generator onto a substrate, prebaking, exposing to high-energy radiation, baking, and developing in an organic solvent developer so that the unexposed region of resist film is dissolved away and the exposed region of resist film is not dissolved. The resist composition exhibits a high dissolution contrast and no swell during organic solvent development, and forms a pattern without collapse and bridging defects.
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