Resist composition, resist film therefrom and method of forming negative pattern using the composition

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United States of America Patent

PATENT NO 9122151
APP PUB NO 20120219891A1
SERIAL NO

13406165

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Abstract

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A resist composition includes a resin (A) containing any of repeating units (a) of general formulae (I-a) and (I-b) below and any of repeating units (b) of general formula (II) below but containing substantially no repeating unit in which an alcoholic hydroxyl group is introduced, and any of compounds (B) of general formulae (III-a) and (III-b) below.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATIONTOKYO 106-8620

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujii, Kana Shizuoka, JP 18 73
Nishiyama, Fumiyuki Shizuoka, JP 23 221
Takahashi, Hidenori Shizuoka, JP 205 2284

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