Vacuum processing apparatus and processing method using the same
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United States of America Patent
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Sep 1, 2015
Grant Date -
Jun 28, 2012
app pub date -
Dec 14, 2011
filing date -
Dec 22, 2010
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Abstract
A vacuum processing apparatus includes a process chamber; a transport unit for transporting a plurality of substrates; a gas supply unit; a substrate processing unit for processing the substrates placed on the transport unit; a detection unit for detecting a substrate interval between adjacent substrates out of the plurality of substrates; and a control unit for controlling, based on the substrate interval detected by the detection unit, a supply amount of the gas to be supplied by the gas supply unit.
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