Radiation-sensitive resin composition, compound and producing method of compound

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United States of America Patent

PATENT NO 9120726
APP PUB NO 20120258399A1
SERIAL NO

13525563

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Abstract

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A radiation-sensitive resin composition includes a compound shown by a following general formula (A), a solvent and a resin having an acid-labile group. Each of R1 and R2 independently represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 25 carbon atoms. Each of X and Z independently represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 25 carbon atoms. Y represents a single bond or the like. n represents an integer from 0 to 5.

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Patent Owner(s)

Patent OwnerAddress
JSR CORPORATION1-9-2 HIGASHI-SHIMBASHI MINATO-KU TOKYO 105-8640

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Maruyama, Ken Tokyo, JP 59 114

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