Process for making nanocone structures and using the structures to manufacture nanostructured glass
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United States of America Patent
Stats
-
Sep 1, 2015
Grant Date -
Jan 31, 2013
app pub date -
Apr 13, 2012
filing date -
Apr 21, 2011
priority date (Note) -
In Force
status (Latency Note)
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Abstract
Fabrication method. At least first and second hardmasks are deposited on a substrate, the thickness and materials of the first and second hardmask selected to provided etch selectivity with respect to the substrate. A nanoscale pattern of photoresist is created on the first hardmask and the hardmask is etched through to create the nanoscale pattern on a second hardmask. The second hardmask is etched through to create the desired taper nanocone structures in the substrate. Reactive ion etching is preferred. A glass manufacturing process using a roller imprint module is also disclosed.
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International Classification(s)
- 2012 Application Filing Year
- C03C Class
- 612 Applications Filed
- 516 Patents Issued To-Date
- 84.32 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 5 Citation Count
- C03C Class
- 18.53 % this patent is cited more than
- 10 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Mar 1, 2027 |
