Process for making nanocone structures and using the structures to manufacture nanostructured glass
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 1, 2015
Grant Date -
Jan 31, 2013
app pub date -
Apr 13, 2012
filing date -
Apr 21, 2011
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Fabrication method. At least first and second hardmasks are deposited on a substrate, the thickness and materials of the first and second hardmask selected to provided etch selectivity with respect to the substrate. A nanoscale pattern of photoresist is created on the first hardmask and the hardmask is etched through to create the nanoscale pattern on a second hardmask. The second hardmask is etched through to create the desired taper nanocone structures in the substrate. Reactive ion etching is preferred. A glass manufacturing process using a roller imprint module is also disclosed.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully