Nanoimprint resist, nanoimprint mold and nanoimprint lithography
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United States of America Patent
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Sep 1, 2015
Grant Date -
Apr 11, 2013
app pub date -
Nov 28, 2012
filing date -
Jun 9, 2009
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Abstract
A nanoimprint lithography method includes the following steps. First, a first sacrifice layer, a second sacrifice layer and a nanoimprint resist are formed on a substrate. The nanoimprint resist includes a hyperbranched polyurethane oligomer, a perfluoropolyether; a methylmethacrylate, and a diluent solvent. Second, a master stamp with a first nanopattern formed by a number of projecting portions and gaps is provided, and the first nanopattern is pressed into the nanoimprint resist to form a second nanopattern in the nanoimprint resist. Third, the second nanopattern is transferred to the substrate.
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