Cleaning apparatus and cleaning method, coater/developer and coating and developing method, and computer readable storing medium
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United States of America Patent
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Sep 1, 2015
Grant Date -
Dec 4, 2014
app pub date -
Aug 14, 2014
filing date -
Feb 12, 2008
priority date (Note) -
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status (Latency Note)
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Abstract
A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion.
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