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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
NOVALED AG	01307 DRESDEN

International Classification(s)

• H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
• C08G:MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN B....
• C07D:HETEROCYCLIC COMPOUNDS

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Amman, Martin	Dresden, DE	1	37
Hartmann, Horst	Dresden, DE	75	835
Limmert, Michael	Dresden, DE	15	195
Werner, Ansgar	Dresden, DE	38	631
Zeika, Olaf	Dresden, DE	23	416

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Feb 25, 2027

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
August 25, 2015	US,9118019,B2   US9118019B2	GRANTED PATENT AS SECOND PUBLICATION
June 14, 2012	US,20120146012,A1   US20120146012A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 9118019

Heterocyclic radical or diradical, the dimers, oligomers, polymers, dispiro compounds and polycycles thereof, the use thereof, organic semiconductive material and electronic or optoelectronic component

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