Apparatus and method for calculating a wafer position in a processing chamber under process conditions
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United States of America Patent
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Aug 25, 2015
Grant Date -
Feb 6, 2014
app pub date -
Jul 31, 2012
filing date -
Jul 31, 2012
priority date (Note) -
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Abstract
An apparatus for processing a wafer including a reaction chamber having a reaction space for processing the wafer, a susceptor positioned within the reaction chamber and having a sidewall, at least one light source positioned outside of the reaction space, at least one window in the reaction chamber, and wherein the at least one light source is directed through the at least one window to contact the sidewall.
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