Electrode plate for plasma etching and plasma etching apparatus
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United States of America Patent
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Aug 25, 2015
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N/A
app pub date -
Sep 26, 2011
filing date -
Sep 27, 2010
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Abstract
An electrode plate for a plasma etching is formed as a disc shape having a predetermined thickness, a plurality of gas holes penetrating a surface of the electrode plate perpendicularly to the surface are provided on different circumferences of a plurality of concentric circles, the electrode plate is divided in a radial direction of the electrode plate into two or more regions, types of gas holes provided in the two or more regions are different from each other by region.
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