Niobium nitride and method for producing same, niobium nitride-containing film and method for producing same, semiconductor, semiconductor device, photocatalyst, hydrogen generation device, and energy system

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United States of America Patent

PATENT NO 9114379
APP PUB NO 20140057187A1
SERIAL NO

13983729

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Abstract

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The present invention is a niobium nitride which has a composition represented by the composition formula Nb3N5 and in which a constituent element Nb has a valence of substantially +5. The method for producing the niobium nitride of the present invention includes the step of nitriding an organic niobium compound by reacting the organic niobium compound with a nitrogen compound gas.

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PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTDOSAKA-SHI OSAKA 540-6207

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hato, Kazuhito Osaka, JP 40 334
Kuroha, Tomohiro Osaka, JP 46 355
Miyata, Nobuhiro Osaka, JP 17 311
Nomura, Takaiki Osaka, JP 58 479
Suzuki, Takahiro Osaka, JP 564 4900
Tamura, Satoru Osaka, JP 46 450
Tokuhiro, Kenichi Osaka, JP 22 366

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