Plasma generation device
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United States of America Patent
Stats
-
Aug 25, 2015
Grant Date -
Nov 6, 2014
app pub date -
May 9, 2014
filing date -
Nov 11, 2011
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
There is provided a plasma generation device capable of suppressing arc discharge in which discharge is localized to cause a high temperature, and allowing atmospheric discharge plasma to be stably generated with a high generation efficiency in a low temperature at about a room temperature without being spatially biased. The plasma generation device arranged with a plurality of electrodes facing each other includes a discharge position control unit, which is arranged between each of the plurality of electrodes, and is formed by containing an inverse characteristic material composed of a fluid having polarizability and a property that dielectric constant decreases with an increase in temperature, in a container formed of a dielectric material, wherein the inverse characteristic material is spaced apart from each of the plurality of electrodes.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2014 Application Filing Year
- H01J Class
- 2291 Applications Filed
- 1924 Patents Issued To-Date
- 83.99 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 6 Citation Count
- H01J Class
- 15.22 % this patent is cited more than
- 10 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Feb 25, 2027 |
