Plasma ignition performance for low pressure physical vapor deposition (PVD) processes
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United States of America Patent
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Aug 18, 2015
Grant Date -
Mar 3, 2011
app pub date -
Aug 31, 2009
filing date -
Aug 31, 2009
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Abstract
A plasma ignition system includes a first voltage supply that selectively supplies a plasma ignition voltage and a plasma maintenance voltage across an adapter ring and a cathode target of a physical vapor deposition (PVD) system. A second voltage supply selectively supplies a second voltage across the adapter ring and an anode ring of the PVD system. A plasma ignition control module ignites plasma using the plasma ignition voltage and the auxiliary plasma ignition voltage and, after the plasma ignites, supplies the plasma maintenance voltage and ceases supplying the plasma ignition voltage and the auxiliary plasma ignition voltage.
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