Method for matching the impedance of the output impedance of a high-frequency power supply arrangement to the impedance of a plasma load and high-frequency power supply arrangement

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United States of America Patent

PATENT NO 9111718
APP PUB NO 20140145636A1
SERIAL NO

14087500

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Abstract

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A method for matching the impedance of the output impedance of a high-frequency power supply arrangement to the impedance of a plasma load includes, in a first impedance matching mode, matching the impedance of the output impedance of the high-frequency power supply arrangement by changing the frequency of the high-frequency signal produced. If the frequency is outside a specified frequency range, in a second impedance matching mode the impedance of the output impedance of the high-frequency power supply arrangement is matched by mechanically or electrically modifying a circuit which is arranged downstream of the high-frequency signal producer.

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Patent Owner(s)

Patent OwnerAddress
TRUMPF HUETTINGER GMBH + CO KGBOETZINGER STRASSE 80 FREIBURG 79111

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Merte, Rolf Freiburg, DE 20 179

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