Optical device and method of in situ treating an EUV optical component to enhance a reduced reflectivity
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United States of America Patent
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Aug 18, 2015
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app pub date -
Jun 12, 2007
filing date -
Jun 12, 2007
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Abstract
A method of in situ treating an optical component reflecting EUV and/or soft X-ray radiation in an optical device includes providing at least one source of one or several surface materials in a vacuum chamber of the optical device where the optical component is arranged. The optical component includes one or several reflecting surfaces having a top layer of one or several surface materials. The method includes providing a source of the one or several surface materials in the chamber, and depositing surface material from the source on the one or several reflecting surfaces during operation and/or during operation-pauses of the optical device in order to cover or substitute deposited contaminant material and/or to compensate for ablated surface material.
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