Projection exposure apparatus with multiple sets of piezoelectric elements moveable in different directions and related method
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United States of America Patent
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Aug 18, 2015
Grant Date -
Dec 20, 2012
app pub date -
Aug 20, 2012
filing date -
Aug 25, 2006
priority date (Note) -
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Abstract
The disclosure relates to a projection exposure apparatus and an optical system, such as a projection objective or an illumination system in a projection exposure apparatus for microlithography, that includes at least one optical element and at least one manipulator having a drive device for the optical element. The drive device can have at least one movable partial element and at least one stationary partial element movable relative to one another in at least one direction of movement.
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