Method for etching conductive metal oxide layer using microelectrode

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United States of America Patent

PATENT NO 9109296
APP PUB NO 20130020115A1
SERIAL NO

13637003

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Abstract

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A method for etching a selected area of a conductive metal oxide layer deposited on a support is provided. The method comprises removing the area via electrochemical route in the presence of a polarized microelectrode and an electrochemical solution. In addition, an etched layer obtained with the foregoing method is provided.

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Patent Owner(s)

Patent OwnerAddress
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES75015 PARIS

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Grisotto, Federico Bailly, FR 2 59
Metaye, Romain Paris, FR 1 59

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