Method for forming anodized layer, method for producing mold and method for producing antireflective film

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United States of America Patent

PATENT NO 9108351
APP PUB NO 20120325670A1
SERIAL NO

13583399

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Abstract

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An anodized layer formation method of an embodiment of the present invention includes the step a of providing an aluminum film which is formed on a first principal surface of a support and the step b of anodizing a surface of the aluminum film to form a porous alumina layer which has a plurality of minute recessed portions. In the step a, a second principal surface of the support which is opposite to the first principal surface is provided with a low heat conduction member that has a predetermined pattern. According to an embodiment of the present invention, a porous alumina layer can be formed which includes regions of different minute structures in the predetermined pattern.

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Patent Owner(s)

Patent OwnerAddress
SHARP KABUSHIKI KAISHASAKAI-SHI OSAKA 590-8522

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hayashi, Hidekazu Osaka, JP 98 670
Isurugi, Akinobu Osaka, JP 21 142
Minoura, Kiyoshi Osaka, JP 233 1329
Nakamatsu, Kenichiro Osaka, JP 28 70

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