Liquid processing apparatus and liquid processing method
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United States of America Patent
Stats
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Aug 11, 2015
Grant Date -
Dec 4, 2014
app pub date -
Oct 23, 2012
filing date -
Oct 24, 2011
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A liquid processing apparatus includes a substrate retaining part that retains a substrate in a horizontal position and rotates the substrate, first and second processing liquid supply nozzles disposed to supply first and second processing liquids, respectively, to the substrate, liquid receiving cups disposed to appropriately position an upper end thereof above the substrate and to receive the first or second processing liquid that has been supplied to the substrate, a first tubular outer cup including an upper opening and disposed around the liquid receiving cup, vertically movable between a lifted position to which the first tubular outer cup is lifted so that its upper end is positioned above the liquid receiving cup, and a lowered position lower than the lifted position, and a second tubular outer cup disposed externally to the first tubular outer cup. The tubular outer cup is selected according to the kind of processing liquid.

First Claim
Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
TOKYO ELECTRON LIMITED | TOKYO 107-6325 |
International Classification(s)
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- B05C:APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MAT....
- B05D:PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MAT....
- B05B:SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B61H:BRAKES OR OTHER RETARDING APPARATUS PECULIAR TO RA....
- B08B:CLEANING IN GENERAL; PREVENTION OF FOULING IN GENE....
- B60B:VEHICLE WHEELS
- F16D:COUPLINGS FOR TRANSMITTING ROTATION
- G01B:MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIME....

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- [Patents Count]
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Aiura, Kazuhiro | Koshi, JP | 21 | 85 |
Itoh, Norihiro | Koshi, JP | 15 | 74 |
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
---|---|---|---|---|
11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Feb 11, 2027 |
Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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