Method for machining seed rods for use in a chemical vapor deposition polysilicon reactor
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United States of America Patent
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Aug 11, 2015
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Mar 12, 2012
filing date -
Mar 12, 2012
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Abstract
A method for machining a profile into a silicon seed rod using a machine. The silicon seed rod is capable of being used in a chemical vapor deposition polysilicon reactor. The machine includes a plurality of grinding wheels. The method includes grinding a v-shaped profile into a first end of the silicon seed rod with one of the plurality of grinding wheels and grinding a conical profile in a second end of the silicon seed rod with another of the plurality of grinding wheels.
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