Photomask blank and method for manufacturing photomask
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 28, 2015
Grant Date -
Oct 4, 2012
app pub date -
Jun 12, 2012
filing date -
Dec 14, 2009
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
According to one embodiment, a photomask blank wherein a second film is stacked on a first film, the first film containing chromium and which is not substantially etched by the dry etching using fluorine and which is etchable by the dry etching using oxygen-containing chlorine, and the second film containing no chromium and which is etchable by dry etching using fluorine and dry etching using oxygen-containing chlorine.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully