Method of fabricating patterned retarder
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 28, 2015
Grant Date -
Jun 7, 2012
app pub date -
Dec 6, 2011
filing date -
Dec 7, 2010
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method of fabricating a patterned retarder includes: forming a retarder material layer on a substrate by coating a retarder material; irradiating a first polarized UV ray onto the retarder material layer, the first polarized UV ray having a first polarization axis; irradiating a second polarized UV ray onto the retarder material layer, the second polarized UV ray having a second polarization axis perpendicular to the first polarization axis; and baking the retarder material layer to form first and second oriented patterns alternating with each other, each of the first and second oriented patterns having an anisotropic property.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully