Substrate processing apparatus
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United States of America Patent
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Sep 8, 2015
Grant Date -
Jun 27, 2013
app pub date -
Dec 4, 2012
filing date -
Dec 4, 2012
priority date (Note) -
Withdrawn
status (Latency Note)
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Abstract
Provided is a substrate processing apparatus including an openable and closable lid and being capable of precisely controlling a gap between multiple shields. The substrate processing apparatus includes: an openable and closable lid provided on an opening of a chamber; a first shield provided on a surface of the lid at the chamber side and having an insertion hole; an insertion section fixed to the lid while inserted through the insertion hole, and configured to support the first shield in a manner movable within a predetermined distance; a restriction section provided on an end portion of the insertion section and configured to restrict the movement of the first shield; and biasing means configured to bias the first shield to a member provided inside the chamber when the lid is closed.
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