Sputtering apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9082595
APP PUB NO 20090114529A1
SERIAL NO

12293891

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Abstract

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A coating apparatus is revealed that is designed to coat substrates by means of a physical vacuum deposition process or a chemical vacuum deposition process or a combination thereof. Said coating apparatus is particular in that it uses a rotatable magnetron (14) that is coverable with an axially moveable shutter (18). Such an arrangement enables to keep the magnetron target clean or to clean the target in between or even during subsequent coating steps. The shutter further provides for a controllable gas atmosphere in the vicinity of the target. The arrangement wherein the magnetron is centrally placed is described. Substrates are then exposed to the sputtering source from all angles by hanging them on a planetary carousel (24) that turns around the magnetron.

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Patent Owner(s)

Patent OwnerAddress
SULZER METAPLAS GMBHAM BOTTCHERBERG 30-38 BERGISCH-GLADBACH D-51427

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
De, Bosscher Wilmert Drongen, BE 42 205
Dekempeneer, Erik Oostmalle, BE 14 97
Verheyen, Pascal Gavere, BE 5 28

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