Electrode having gas discharge function and plasma processing apparatus
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United States of America Patent
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Jul 14, 2015
Grant Date -
Oct 4, 2012
app pub date -
Mar 30, 2012
filing date -
Mar 31, 2011
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Abstract
An electrode having a gas discharge function, where the degree of freedom related to a maximum gas flow rate is abundant, an electrode cover member may be thinned, and a change of a gas behavior according to time is difficult to be generated in a processing chamber during gas introduction. The electrode includes: a base material having a plurality of gas holes; and an electrode cover member having a plurality of gas holes respectively corresponding to the plurality of gas holes of the base material in a one-to-one manner, fixed to the base material, and disposed facing a processing space in which the object is plasma-processed, wherein a gas hole diameter of the electrode cover member is larger than a gas hole diameter of the base material.
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