Method to texture a lamina surface within a photovoltaic cell
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United States of America Patent
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Jun 30, 2015
Grant Date -
Aug 16, 2012
app pub date -
Apr 13, 2012
filing date -
Feb 5, 2008
priority date (Note) -
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Abstract
It is advantageous to create texture at the surface of a photovoltaic cell to reduce reflection and increase travel length of light within the cell. A method is disclosed to create texture at the surface of a silicon body by reacting a silicide-forming metal at the surface, where the silicide-silicon interface is non-planar, then stripping the silicide, leaving behind a textured surface. Depending on the metal and the conditions of silicide formation, the resulting surface may be faceted. The peak-to-valley height of this texturing will generally be between about 300 and about 5000 angstroms, which is well-suited for use in photovoltaic cells comprising a thin silicon lamina.
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