Electroplating using dielectric bridges
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United States of America Patent
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Jun 30, 2015
Grant Date -
Jan 1, 2015
app pub date -
Sep 27, 2013
filing date -
Jun 27, 2013
priority date (Note) -
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Abstract
Structures and methods provide a dielectric bridge for use in electroplating. A method comprises: providing a semiconductor wafer with a plurality of die, wherein a first die is adjacent to a second die, and the first die and second die are separated by a dicing street area; forming a patterned dielectric layer overlying the semiconductor wafer, the dielectric layer including a dielectric bridge that crosses the dicing street area; forming a conductive layer (e.g., a metal seed layer) overlying the dielectric layer, wherein a portion of the conductive layer is overlying the dielectric bridge to provide a current pathway from the first die to the second die; and electroplating targeted areas of the conductive layer by providing current to the second die using the current pathway. Other such bridges formed from the dielectric layer provide current pathways to other die on the wafer.
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