High light transmission, low sheet resistance layer for photovoltaic devices
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United States of America Patent
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Jun 9, 2015
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N/A
app pub date -
Oct 8, 2010
filing date -
Oct 8, 2009
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Abstract
Methods and devices are provided for forming a low-resistance, high light transmission layer. In one embodiment of the present invention, a method is provided comprised of creating a plurality of vias on a substrate, the vias formed in material that has a maximum processing temperature that less than a pre-defined threshold; adding a plurality of electrically conductive material into the vias; and solution depositing a nanowires infused window layer that has a first thickness at certain areas and a second thickness at other areas, wherein overall sheet resistance is between about 1 to 10 ohms per square, while light transmission combined is at least 70% and creates less than 5% shadow loss. The method may involve using a transparent conductive oxide layer beneath the window layer. This can create a layer that eliminates opaque bus bars or fingers associated with traditional solar cells. This may be an all-solution deposited process using only one deposition set or multiple deposition steps.
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