Apparatuses and methods for detecting wave front abberation of projection objective system in photolithography machine
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United States of America Patent
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Jun 2, 2015
Grant Date -
Aug 28, 2014
app pub date -
Nov 30, 2011
filing date -
Nov 30, 2011
priority date (Note) -
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Abstract
Apparatus and methods for detecting wave front aberration of a projection objective lens in a photolithography machine are disclosed. The apparatus comprises: a light source system configured to generate an illuminating beam; a spatial filter configured to receive the illuminating beam and generate ideal spherical wave; a splitter plate arranged downstream to the spatial filter at a predetermined angle with respect to an optical axis of the spherical wave and having a transflective film being applied on a surface thereof; the projection objective lens configured to receive a beam from the splitter plate and generate an output beam; a spherical mirror configured to reflect the output beam from the projection objective lens to the projection objective lens, light passing through the projection objective lens being reflected by the splitter plate; and an interferometer configured to receive light reflected by the splitter plate and measure the wave front aberration of the projection objective lens.
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